Characterization of Zinc Oxide Thin Films for Gas Sensing Applications through Sputter Deposition and Thermal Annealing

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Dwivedi, M and Mudgal, T and Srivastav, SR and Komal, J and Bhargava, AK and Sharma, AK and Vyas, V and Eranna, G (2013) Characterization of Zinc Oxide Thin Films for Gas Sensing Applications through Sputter Deposition and Thermal Annealing. In: International Conference on Emerging Technologies : Micro to Nano 2013 (ETMN-2013), February 23-24, 2013, BITS, Pilani, K.K. Birla Goa Campus, Goa. (Submitted)

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Abstract

ZnO is a strategic material for various sensing application. We have deposited the thin film of zinc oxide (ZnO) on silicon dioxide (SiO2) substrates from room temperature using Radio frequency (RF) magnetron sputtering method. We present our results on characterization of these thin films of ZnO deposited by RF sputtering and post annealing methods. The characterization techniques involved, X-Ray Diffraction (XRD) and energy dispersive X-ray (EDX). ZnO thin films by sputter have been annealed at different temperatures from 2000C to 4000C for gas sensing applications.

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: RF magnetron sputtering, ZnO Thin Film, Annealing, Energy dispersive X-ray and X-Ray Diffraction
Subjects: ?? TK ??
Semiconductor Devices > Sensors and Nanotechnology
Divisions: Semiconductor Devices
Depositing User: Mr. Rabin Chatterjee
Date Deposited: 20 May 2013 09:22
Last Modified: 20 May 2013 09:22
URI: http://ceeri.csircentral.net/id/eprint/60

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