An Extensive Fabrication of Eight Beam Configured Piezoresistive Micro Accelerometer

Gupta, SK and Singh, J and Pathak, BC and Gupta, AK and Kothari, P and Singh, A and Panwar, DK and Bhatia, RR and Akhtar, J (2013) An Extensive Fabrication of Eight Beam Configured Piezoresistive Micro Accelerometer. In: International Conference on Emerging Technologies: Micro to Nano 2013 (ETMN - 2013), February 23-24, 2013, Goa, India. (Submitted)

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Abstract

In this paper, the design and fabrication process of an eight beam configured single axis planar piezoresistive MEMS accelerometer is discussed in detail. Cantilever beam and calculated amount of proof mass was realized using bulk-micromachining in TMAH solution. Thickness of beam was controlled by back to front side etching technology. The resistors were place at appropriate location by analyzing the place using finite element method in ANSYS simulation. LPCVD polysilicon was used as a piezoresistors with thermal doping of boron at 1050oC for 40 minutes. The wafer level testing was performed and the measured value of resistors were analyzed and presented here.

Item Type:	Conference or Workshop Item (Paper)
Uncontrolled Keywords:	Polysilicon, MEMS, Accelerometer,
Subjects:	?? TK ?? Semiconductor Devices > Sensors and Nanotechnology
Divisions:	Semiconductor Devices
Depositing User:	Mr. Rohit Singh
Date Deposited:	23 May 2013 09:20
Last Modified:	23 May 2013 09:20
URI:	http://ceeri.csircentral.net/id/eprint/55

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