Silicon Micromachined K-band Filters

Khandelwal, SK and Bansal, D and Rangra, KJ (2012) Silicon Micromachined K-band Filters. In: International Conference on Computing, Electronics and Electrical Technologies (ICCEETS - 2012), March 21 - 22, 2012, Kanyakumari, India. (Submitted)

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Abstract

This paper describes a substrate integrated waveguide (SIW) based filter at K band frequency on silicon substrate. TMAH etching is used to form the via-holes for SIW cavities. Simulations and comparison of TMAH and inductively coupled plasma (ICP) etched cavity has been presented. A micro- machined filter is made from rectangular cavities integrated into a silicon substrate and is fed by coplanar waveguide (CPW) transmission-lines through current probes. Simulated filter using TMAH etching shows insertion loss of 0.29dB and return loss of 21.96 dB.

Item Type:	Conference or Workshop Item (Paper)
Uncontrolled Keywords:	Micromachined filters, Substrate integrated waveguide (SIW), inductively coupled plasma (ICP), TMAH
Subjects:	Semiconductor Devices > Sensors and Nanotechnology
Divisions:	Semiconductor Devices
Depositing User:	Mr pvlr reddy
Date Deposited:	27 May 2013 09:55
Last Modified:	27 May 2013 09:56
URI:	http://ceeri.csircentral.net/id/eprint/204

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