Microfluidic Channel Farbication using Poly-Si as a Sacrificial Layer


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Maurya, RK and Prajesh, R and Alam, MA and Agarwal, A (2019) Microfluidic Channel Farbication using Poly-Si as a Sacrificial Layer. In: 16th IEEE India Council International Conference (INDICON- 2019), December 13-15, 2019, Marwadi University, Rajkot, Gujrat, India.

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In this work, process development for the realization of Microchannels is carried out using standard micro fabrication techniques with polysilicon as sacrificial material. Polysilicon (PolySi) material is deposited using LPCVD process. Thermal silicon oxide layer work as a capping layer after the polysilicon layer is released using wet chemical etching using Tetra Methyl Ammonium Hydroxide (TMAH). Fabricated microchannels are characterized using 3D optical imaging and scanning electron microscopy. Fabrication of the Microchannel with an open cross-section of 4 µm X 0.85 µm and 50 µm length is demonstrated.

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: Micro/nanofluidics, microchannel, ionic switch, FET
Subjects: Semiconductor Devices > Sensors and Nanotechnology
Divisions: Semiconductor Devices
Depositing User: Mr. Jitendra Nath Bajpai
Date Deposited: 10 Sep 2021 11:32
Last Modified: 10 Sep 2021 11:32
URI: http://ceeri.csircentral.net/id/eprint/514

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