Dhariwal, S and Kumar, J and Singh, J and Akhtar, J
(2016)
Correlation between the Morphology of Reactive Sputtered NiFeO Nanocomposite Thin Films and their Electric and Magnetic Properties.
In: IEEE International Symposium on Electronics and Smart Devices (ISESD 2016), 29-30 November 2016, Bandung, Indonesia.
(Submitted)
Abstract
This paper presents experimental results of series of activities in which firstly Nife soft magnetic thin films were sputtered by reactive sputtering technique on oxidized silicon substrate by varying constituents to obtain a permalloy (Nis0Fe20) composition. Later the effect of addition of non• magnetic reactive gas (oxygen) on the electric and magnetic properties were investigated. TI1e oxygen partial pressure was varied in the range of 3-27% keeping total pressure constant at
7mTorr. The particle size which plays a key role in tailoring the magnetic properties varied from 7 .26-4 nm. Maximum saturation magnetization (Ms) of 602 emu/cc was obtained at 16% oxygen partial pressure (Po2) with a particle size of 4.5 nm. It was observed that the shape ofM-H loop changes as the oxygen partial pressure increases during reactive sputtering. Magnetic loop corresponding to 23% P02 sample shows exchange biased behavior, which is generally a multilayer thin film phenomenon but here it is obtained in single layer thin film. The addition of oxygen in the magnetic thin films degrades the magnetic properties beyond 23% oxygen partial pressure.
Actions (login required)
 |
View Item |
